Abraham Marmur

Technion– Israel Institute of Technology, Israel

Title: Concepts of surface tension and adsorption revisited

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Biography

Abraham (Avi) Marmur received his D.Sc. in 1974 at the chemical engineering department, Technion – Israel Institute of Technology, then spent two years in Buffalo, NY as a postdoc with Eli Ruckenstein. He returned to Technion in 1976 as a faculty member and is now a Professor Emeritus. He spent two Sabbatical years, one at the University of Wisconsin, Madison, and another at the IBM Almaden Research Center. Prof. Marmur has worked and published extensively in the field of interfacial phenomena, and his publications are highly cited. In addition, he was an editor of Reviews in Chemical Engineering, and was on the advisory committee/editorial board of Journal of Colloid and Interface Science, Journal of Adhesion Science and Technology, Advances in Colloid and Interface Science, Colloids and surfaces A, Surface Reports, Entropy, and Surface Innovations. At Technion, professor Marmur received awards for excellence in research and in teaching. 

Abstract

The fundamental concepts of surface tension and adsorption are revisited. It is shown that surface tension of a liquid can be defined without the concept of dividing surface and that this definition also clarifies the adsorption equation. In addition, it is demonstrated that very negative pressures must exist in the interfacial layer. Finally, the concept of surface tension of a solid is critically discussed.